A two days workshop on nano-device fabrication
Miniaturize your company’s products and create new markets and revenues. A hands on training event: join this workshop if you want to create nano-sized products and devices for your company.
This workshop is intended for scientist and engineers who are working in the field of electronics, sensors and biology or have to take strategic decisions on nanofabrication for their company. The workshop will mainly be focusing on two of the most useful nanofabrication techniques: electron beam and nano-imprint fabrication. Attendees will take part in designing and fabricating e-beam masters and have hands on experience of using it in nano-imprint fabrication. At the end of the two days workshop attendee will have a good knowledge about the limitations and the applications of these fabrication techniques to create nanoscale devices.
Fee: £595 for two days workshop including lunch, refreshments and one dinner.
Dates: 10th-11th November 2010
Venue: Nanoscience Centre
University of Cambridge
11 JJ Thomson Avenue
Cambridge CB3 0FF
To register for the workshop contact Dr Atif Aziz.
Tel.: +44 (0)1223 760302
• Introduction to the e-beam and nano-imprint fabrication
• Pattern designing and using e-beam system
09:00 – 09:10 Welcome
09:10 - 09:50 Introduction to e-beam lithography for nano device fabrication
Electron beam lithography is a highly developed nano fabrication technique. It has been demonstrated to achieve 4nm resolution. When combined with nano-imprint lithography, nanoscale patterns can be created over large areas at very low cost. In this lecture, history, fundamental concepts, designing and working of e-beam lithography will be discussed.
10:00 - 10:40 Applications of e-beam lithography
E-beam lithography is one of the highest resolution fabrication tools available. Its applications vary from mask fabrication to creating single electron transistors. This technology has been applied to the fabrication of various devices, including patterned magnetic disks, optical devices, nano-bio devices, micro-fluidics. micro-electro mechanical system (MEMS) devices and transistors. In this lecture we will discuss about various devices and their fabrication processes where e-beam lithography plays a very vital role.
20 mins tea break and discussion
11:00 - 11:30 Nano-imprint lithography
Nano-imprint lithography (NIL) is an emerging lithographic technology that promises high throughput patterning of nanostructures on large area substrates. Resolution of NIL is not constricted by the diffraction limit and it is possible to achieve sub 10nm resolution features. In this lecture the principles of nano-imprint lithography will be discussed which will lay the foundation for actual nano-imprint lithography which will take place in the modules to follow later in the day.
11:30 - 12:00 Scanning electron microscopy
Scanning electron microscope is a very important observation and analysis tool for characterising nano-devices. Images of the nano-world are created using electrons. When a very fine beam of electrons hit the sample, secondary electrons are knocked loose from the surface. A detector counts these secondary electrons as a function of beam position and generate image. In this lecture the principles of scanning electron microscope and its application will be discussed.
Lunch Break: 12:00 – 13:00
13:00 - 14:20 Pattern design
Attendees will be assigned different pattern designing projects. Taking into consideration the design rules, they will create pattern structures which will be used in e-beam and nano-imprint lithography to produce real nano structures.
14:30-15:00 Introduction to the Cleanroom facility
From now on most of the work will be performed in the clean room. An introduction to the clean room and health and safety guidelines will be given to prepare the attendee for working in the cleanroom.
15:00 - 17:00 Substrate preparation and using e-beam lithography system
Substrate preparation for e-beam lithography will be performed and the instructor will explain the step by step procedure for performing the e-beam lithography. Designs created by the attendee will be used for exposing the e-beam resist. System will run overnight for exposing these patterns.
• Fabricating e-beam master and analysis using scanning electron
• Nanoimprint lithography
9:00-10:30 Practical experience of making a NIL master stamp.
Samples will be taken out of the system and the rest of the lithography process and the NIL master stamp will be fabricated in the clean room.
10:30 -13:00 Analysing the master copy using SEM
It is important to assess the quality of the master stamps. SEM will be used for close inspection of the nano imprint master copies.
Lunch break: 13:00 -14:00
14:00 - 15:30 Nano-imprint lithography
These master copies will be used for creating soft copies using NIL. Soft stamps will further be used for creating nano structures.
15:30 - 16:30 Observation of the end devices using AFM
Fabricated nanostructures will be examined using AFM.
16:30 - 17:00 Discussion and Q & A
We will finish the day with the discussion and the question answer session. At the end of the workshop certificates will be presented.
End of workshop at 17:00.